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Tools - Lithography and Patterning Tools
The tools listed below can be used to process 300mm wafers:
ASML AT:1150i - 193nm immersion, NA 0.75
ASML TWINSCAN AT:1200B - 193nm ‘dry' tool capable of 80nm imaging
ASML TWINSCAN 1700i -193nm "immersion" tool capable of 50 nm imaging
ASML TWINSCAN 1950i - 193nm ‘"immersion" tool capable of 22nm imaging
TEL Clean Track LITHIUS 1.5 Block 300mm coater/developer tools
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