In August 2006 the College of Nanoscale Science and Engineering of the University at Albany took delivery of the world’s first extreme ultraviolet (EUV) Alpha Demo Tool (ADT) - a $65 million tool that represents a critical step in the development and commercialization of EUV technology, vital to the future of nanoelectronics manufacturing.

Developed by Netherlands-based ASML Holding NV (ASML), the leading global supplier of advanced lithography tools, the EUV ADT is the world’s first full-field EUV tool. This R&D tool will be essential in development of the infrastructure for EUV lithography, considered the most likely technology to address the 32nm computer chip device node, based on cost-effectiveness and ability to extend to future nodes, according to ASML.

Once integrated into CNSE’s Albany NanoTech complex, the EUV ADT will support the R&D programs of the $600M International Venture for Nanolithography (INVENT), a global industry-university consortium for research and development, education and technology deployment for future generations of nanolithography applications.

Click here to read the press release.