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Product qualification support is provided at CNSE with access to a unique state-of-the-art industry standard semiconductor fabrication facility, which serves as a technology test-bed leading to the development, demonstration, integration and qualification of advanced fabrication technologies for the semiconductor industry.
NanoFab 300 North
The 35,000 square feet of clean room space in NanoFab 300N is dedicated to supporting the nanoelectronic industry's advanced R&D needs. The tool sets installed in these new facilities are dedicated to supporting the industry's 300mm wafer processing needs for the next several device generations including 65nm, 45nm, 32nm and 22nm through the full transition to nanotechnology.
The facility houses several 300mm wafer process tools including advanced lithography platforms to support 193nm immersion lithography development and EUV lithography development. Also installed are advanced 300mm wafer platforms for planarization, copper plating, etch development, ion implantation, thin film development and wet cleaning technology.
NanoFab 300 South
This technology acceleration facility provides space for business incubation, CNSE classrooms, workforce training, offices, and large and small industrial sponsors and partners including IBM, TEL, Applied Materials, ASML and International SEMATECH North. The facility includes 32,000 square feet of cleanroom to support these partners and other next generation nanotechnology research activities.
NanoFab 300 East
This $150 million project includes a 250,000-square-foot office, laboratory and classroom building and a separate 100,000-square-foot building that houses 15,000 square feet of 300mm wafer, class 1 capable cleanroom space.
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Chip Fabrication Facilities
