World-Class Resources > CNSE Wafer Processing Research & Development > Lithography and Patterning Tools > ASML 1200b 193nm ‘Dry' Tool

ASML 1200b 193nm ‘Dry' Tool Capable of 80nm Imaging

As part of its integrated imaging facilities, CNSE has a TWINSCAN AT 1200 193 nm 'dry' SCANNER; (.85 NA). This tool, as is all the CNSE tool set is set up to image 300mm wafers with excellent across wafer uniformity while delivering an estimated 100+ wafers per hour. Though this tool was manufactured to satisfy the needs of the 90nm node, the CNSE team routinely demonstrates the ability to print sub 90nm features with this tool.