World-Class Resources > CNSE Wafer Processing Research & Development > Analytical Services > SIMS

Capabilities:

• 300mm full wafer handling
• Static mode:  measurement of organic molecules on surfaces
• Dynamic mode: Depth profiling  
• Ion imaging mode:  lateral resolution as low as 250nm

Typical applications:

• Measurement of dopant profiles in Si and compound semiconductors
• Measurement of impurities in semiconductor films, metal films 
• Measurement of inorganic and organic surface contaminants 
• Mapping impurity distributions in deposited metals

Typical data: