World-Class Resources > 200mm Wafer Fabrication > Mask Layout
After simulation and modeling, the final designs of the devices are laid out using L-Edit to produce photo masks. L-Edit is a VLSI design tool; it is also flexible enough to do micromachining design, printed circuit board layout, and other CAD work.
Wafer level mask layout
1 square cm die
Example of the mask layout for MEMs devices that include MOEMS,
actuators and fluidic components.
Photo masks generated by CNSE are used to process substrates in the CNSE 200 and 300 mm fabrication facilities, where substrate sizes ranging from 100 mm to 300 mm can be accommodated.