6/27/2012 12:00:03 PM

Semiconductor Manufacturing & Design: CNSE readying NFX Fab for G450C, EUV efforts

Semiconductor Manufacturing & Design

Two key areas of the semiconductor industry’s future—the 450mm wafer transition and EUV lithography—are the focus of the new NFX (NanoFab Xtension) building now under construction at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

The cooperative research effort at CNSE and the Global 450 Consortium (G450C) could springboard New York into the 450mm fab era at some point, said Alain Kaloyeros, senior vice president and CEO of CNSE. The consortium, announced by New York Governor Andrew Cuomo in September 2011, includes IBM, Intel, GlobalFoundries, TSMC and Samsung, as well as CNSE.

Kaloyeros, in an interview at the NanoFab complex, said, “Now that there is a consensus that 450 is happening, our role is to create the environment, enable the resource innovation and the manufacturing innovation for the transition. The NFX facility is going to be heavily focused on tool development and demonstration, but at the end of the day, all this is going to be driven by innovation.”

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