Leading-Edge Research and Development > Research Profiles > Profiles Archive > CNSE student receives 'extraordinary opportunity' to work on pioneering EUV tool
CNSE student receives 'extraordinary opportunity' to work on pioneering EUV tool
Sudhar Raghunathan moved from India to pursue a world-class nanotechnology education at CNSE. Little did he know that he would become one of the only students anywhere to work with the world's first extreme ultraviolet (EUV) Alpha Demo Tool (ADT).
|Professor John Hartley and Sudhar Raghunathan |
Born and raised in India, Sudhar attended the University of Madras for his undergraduate degree. His studies related to semiconductors and nanoscale device fabrication, and as he began to think about his graduate study, he knew he wanted to focus on nanotechnology. It made sense for Sudhar to choose to attend the world's number one college for nanotechnology.
Now in his fourth year at CNSE, Sudhar has already had an incredible overall experience at CNSE. "I have been able to participate in a wide range of research projects," says Sudhar. "While studying at CNSE, I have been able to experience different aspects of working with nanotechnology, from EUV Lithography and electron beams to DNA."
This summer Sudhar participated in an internship with AMD on-site at CNSE's Albany NanoTech Complex, which gave him the unique opportunity to work with ASML's EUV ADT. The EUV ADT is a $65 million tool that represents a critical step in the development and commercialization of EUV technology. The world's first full-field EUV tool, the EUV ADT is helping to address lithography needs for the manufacture of computer chips for the 22nm node and beyond, based on cost-effectiveness and the ability to extend to future nodes. At CNSE, the EUV ADT supports the IMPLSE program, a global industry-university consortium for research and development, education and technology deployment for future generations of nanolithography applications.
Sudhar works on the world's first
extreme ultraviolet (EUV) Alpha
Demo Tool (ADT).
"The fact that a student has been given this extraordinary opportunity to work with ASML's EUV ADT shows something very unique about CNSE," says CNSE Professor of Nanoengineering John Hartley, who is Sudhar's advisor. "No other university in the world could even comprehend what it means to have a tool like this on-site, let alone give students the experience of working with one. This is symbolic of everything that we hope to achieve at CNSE: giving students the ultimate learning experience by offering them opportunities to work directly with our corporate partners on-site and operate cutting-edge tools."
"While attending CNSE, I have had many opportunities presented to me, including my recent summer internship," says Sudhar. "The EUV ADT is a large and complex tool and using it has been an incredible learning experience. I have appreciated applying my skills and knowledge learned at CNSE to real-life work during my AMD internship."
Sudhar's experience at CNSE has even inspired his brother to move to the United States to pursue a degree at CNSE working with Professor Hartley. In addition to acting as a mentor to his brother, Sudhar hopes his future plans include getting a job with one of CNSE's partners and continuing to work on-site at CNSE's Albany NanoTech Complex.