Chimaobi Mbanaso recently completed the first year of his Ph.D. program at CNSE. Reflecting on his experience so far and on what brought him here, he says CNSE is "the perfect environment for young minds in nanotechnology."
"Even before I completed my internship at CNSE during the summer of 2005, I knew I had encountered a unique environment like none other, where I could expand my academic and professional horizons in advanced science and engineering techniques."
Chimaobi says he is fascinated by the plethora of information on emerging nanotechnology that he encounters on a daily basis as part of the CNSE community. From the colloquia series that presents distinguished researchers from different parts of the country, to discussing advanced methods in research with world-class faculty, to first-hand access to a wide variety of operative equipment and tools for conducting analytical measurements – he sees that the opportunities for growth at CNSE are limitless.
In addition, Chimaobi appreciates the fact that industry professionals from CNSE's onsite corporate partners "are always willing to offer an industrial and practical perspective to project ideas, and this leads to pioneering applicable projects in the real world."
Chimaobi completed his undergraduate degree in Electrical Engineering at Howard University in Washington, DC in May 2006. As an undergraduate, he participated in CNSE's renowned Summer Internship program during the summer of 2005. Chimaobi calls this experience "remarkable." Not only did it expose him to the foundational processes in the fabrication of transistors and computer integrated circuits – but also to the ideal location to continue his graduate education.
At CNSE, Chimaobi's current research is centered on Extreme Ultraviolet Lithography (EUVL), which is widely acknowledged to be the next-generation lithography technique used for manufacturing computer chips. The EUVL process requires light operating at a wavelength of just 13 nanometers – much shorter than the wavelength of visible light – employed to imprint smaller features that will enable the production of more powerful processors for computers. Before this new technology can be applied to large scale integration, a number of challenging issues pertinent to its use are being investigated around the world.
The features imprinted by EUV light are patterned on EUV photoresists. One of the key concerns in using these photoresists is evaluating how sensitive they are to radiation outside the wavelength confines of 13 nm. Due to the fact that EUV sources produce some unwanted light at wavelengths outside the band of the EUV radiation, and utilize optics that reflect this out of band light, there is the potential of subsequent reduction in the image contrast on the wafer, resulting in poor features.
Chimaobi's research is aimed at properly examining the wavelengths of light that will adversely affect the sharpness of the image definition on these wafers. Under the guidance of his advisor, Professor Gregory Denbeaux, Chimaobi is designing a system that comprises an arc lamp and a monochromator with the appropriate collection optics to measure and determine how sensitive these potential EUV photoresists are to light at various wavelengths.
It's a challenge for which he's well prepared. "The opportunity to be part of an environment that encompasses research and development not only from an academic perspective, but also from an industrial outlook, provides a complete and well rounded educational experience which surpasses any other."
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