About Us > Faculty & Staff > Technical Staff > Wenli Z. Collison
Wenli Z. Collison
G450C Reactive Ion Etch Engineer
Professional Background:
- RIE Staff Engineer: G450C, Albany, NY. 2012-present
- Staff Process Engineer : Lam Research, Albany, NY. 2010-2012
- Consultant: Intevac Inc., Santa Clara, CA. 2006-2010
- Staff /Senior /Process Engineer III: Lam Research. Fremont, CA. 1995-2004
- Postdoctoral Researcher : Univ. of Illinois, Urbana-Champaign, IL. 1994-1995
Education: - 1994 Ph.D. (Plasma Physics), Univ. of California, San Diego
- 1991 M.S. (Physics), Univ. of California, San Diego
- 1989 B.S. (Solid State Physics), Univ. of Science and Technology of China
Responsibilities:
As an etch engineer in the G450C etch team, Ms. Collison is currently the tool owner for three etch systems and process owner for several key FEOL/BEOL applications. She is the primary contact for two etch equipment suppliers. She is also responsible for evaluating etch process equipment capability for 14nm-10nm node, facilitating tool installation and etch process development for 450mm test wafer module integration.
Issued Patents: 12 issued patents.
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Patent No. 8,114,246 Issue date: Feb. 2012
Inductively coupled plasma downstream strip module Patent No. 6,692,649 Issue date: Feb. 2004
Plasma processor with coil having variable rf coupling Patent No. 6,229,264 Issue date: May 2001
Processing chamber with optical window cleaned using process gas Patent No. 6,052,176 Issue date: April 2000
Publications and Conferences:
Studies of the Low-pressure Inductively-coupled Plasma Etching for a Larger Area Wafer Using Plasma Modeling and Langmuir Probe JVST A Jan. 1998 Wenli Collison, Tom Ni and Michael Barnes
A 3-D Model for Inductively-coupled Plasma Etch Reactors Invited Talk AVS New Mexico Chapter Annual Meeting 1997 Mark Kushner, Wenli Collison, Michael Grapperhaus, John Holland and Michael Barnes