About Us
Newsroom
Contact
Careers
Outreach
Intranet
Search
Pioneering Academics
World-Class Resources
Leading-Edge Research & Development
Welcome
CNSE Quick Facts
CNSE's Albany NanoTech Complex
Vision and Mission
History
UAlbany Senate
Bylaws/Charters
Faculty & Staff
Executive Staff
Faculty
Operational Staff
Technical Staff
Careers at CNSE
About Us
About Us
>
Faculty & Staff
>
Technical Staff
>
Corbet S. Johnson
Corbet S. Johnson
Metrology Process Engineer
Professional Background:
ON Semiconductor, East Greenwich, RI
Device Engineer - Yield Enhancement Investigate yield issues using KLA inspection and defect review toolset (2122/4200C/SP1) and FEI 600XL FIB.
Failure Analysis Engineer - Primary Investigator of customer returned ICs using non-destructive and destructive analysis techniques including X-Ray, Optical, Scanning Acoustic microscopy and Photon Emissions Microscopy, Manual Probe stations, Wet and Plasma etch chemistries, SEM/EDS and Focused Ion Beam analysis. Other duties included assisting Design Engineering teams with FIB circuit modifications.
United Technologies - Otis Elevator Company, Farmington, CT
Failure Analysis Technician - Responsible for the set-up of the Electrical Test Qualification Center (ETQC) and failure analysis laboratory.
Allegro Microsystems - Worcester, MA
Failure Analysis Technician - Developed technique for electrical probing of plastic encapsulated ICs with polyimide passivation and ILD layers.
United States Air Force
Integrated Avionics Electronic Warfare Equipment and Component Specialist
Received Medal of Acheivement for excellence in troubleshooting and maintenance of various EW equipment systems.
Education:
B.Sc. (Industrial Technology), Southern Illinois University
Responsibilities:
Recipe creation/management for CNSE JDP projects for all CSR/INVENT metrology tools
Engineering team member for SEMATECH EUV, FEP and 3D Interconnect research projects.
Provide KLARITY defect analysis support for CNSE and its customers.
Act as liaison between CNSE engineering and CNSE metrology faculty members.
Key Accomplishments:
Created TEM lamella showing CNSE's ability to create 5.3nm FIN structures.
Enabled front surface TXRF process monitoring in CNSE's Center for Semiconductor Research.
{1}
##LOC[OK]##
{1}
##LOC[OK]##
##LOC[Cancel]##
{1}
##LOC[OK]##
##LOC[Cancel]##