About Us > Faculty & Staff > Faculty > John G. Hartley

Professor and Head, Nanoengineering Constellation; Director, Advanced Lithography Center

Dr. Hartley Discusses the Nanoengineering Constellation

Watch Professor Hartley's "Inside CNSE" video interview on the capabilities of CNSE's electron beam technology

Read Professor Hartley's Nanotechnology Now web site article: What is lithography?

Degrees:

• Ph.D., Physics, The University of Texas at Austin, 1988

Areas of research:

• Lithography
• Electron beam lithography
• System architecture
• Systems engineering

Description of research:

Professor Hartley's research centers on the development of the macro science and engineering that enables the nano. Prior to joining the CNSE faculty, Hartley worked at IBM for 15 years developing leading edge ebeam patterning systems for IBM's internal use. These systems are a complex interaction of electron beam physics, leading edge digital and analog electronics, precision mechanics and software. Over the course of his career, he has been involved in all components to the point which has led to his development of the system architecture for the latest generation tools.

With this scope of experience, Hartley is developing research programs at CNSE that focus on various components of lithography tooling development, not only in electron beam lithography but also in other areas of equipment infrastructure relevant to the nanotech industry. Future projects will draw on resources in physics as well as electrical, mechanical and software engineering. Hartley welcomes inquiries from potential students in all of the above-mentioned areas who are interested in working on the technology behind the nanotechnology.

Publications:

M. Brown, J. Hartley, S. Eichenlaub, A. Rastegar, P. Marmillion, K. Roessler, Point cleaning of mask blanks for extreme ultraviolet lithography, Proc. SPIE, Vol. 6349 63492K (Oct 2006)

J. Ruan and J.G. Hartley, Electrostatic chuck fringe field simulation and its impact on electron beam EUV mask patterning, J. Vac. Sci. Technol. B 24, 2681-5 (2006)

S. Raghunathan, L. Govindaraju, J. Ruan and J. G. Hartley, Fringe field theory and experiment for electrostatic chucking of extreme ultraviolet photomasks, J. Vac. Sci. Technol. B 25, 38-42 (2007)

M. Tittnich, J. Hartley, G. Denbeaux, U. Okoroanyanwu, H. Levinson, K. Petrillo, C. Robinson, D. Gil, D. Corliss, D. Back, S. Brandle, C. Schwarz, F. Goodwin, Y. Wei, B. Martinick, R. Housley, P. Benson and K. Cummings, A year in the life of an immersion lithography alpha tool at Albany NanoTech, Proc. SPIE 6151, 615101 (2006)

John G. Hartley and Lakshmi Govindaraju, Economic consequences of high throughput maskless lithography, Proc. SPIE, 5992, 599226 (2005)

Junru Ruan and John Hartley, Electron beam pattern generator sensitivity to target potentials, Proc. SPIE, 5992, 59924T (2005)

J. G. Hartley, S. Raghunathan, and A. Govindaraju, Electrical characterization of multilayer masks for extreme ultraviolet lithography, J. Vac. Sci. Technol. B 23, 2891 (2005)

John G. Hartley, Timothy R. Groves, Henry I. Smith, Mark K. Mondol, James G. Goodberlet, Mark L. Schattenburg, Juan Ferrera, and Alexandr Bernshteyn, Spatial-phase locking with shaped-beam lithography, Rev. Sci. Instrum. 74, 1377 (2003)

(INVITED) Hans C. Pfeiffer and John Hartley, Advanced mask-making with a variable-shaped electron beam, Semiconductor FABTECH 15, 129 (2002)

Wu-Song Huang, Ranee W. Kwong, John G. Hartley, Wayne M. Moreau, Marie Angelopoulos, Christopher Magg, Mark Lawliss, CA resist with high sensitivity and sub-100-nm resolution for advanced mask making, Proc. SPIE, 4066, 150 (2000)

Ranee Kwong, Wu Song Huang, J. G. Hartley, W. M. Moreau, C. F. Robinson, M. Angelopoulos, C. Magg, M. Lawliss, A CA resist with high sensitivity and sub 100nm resolution for advanced mask and device making, Proc. SPIE - Int. Soc. Opt. Eng. (USA) 3997 2000 P352-60

John G. Hartley, Possible experimental test of Wheeler-Feynman Absorber Theory, Proceedings NASA Breakthrough Propulsion Physics Workshop - NASA/CP-1999-208694, 221 (1999)

Neal Caldwell, Raymond Jeffer, Mark Lawliss, John G. Hartley, Performance of the EL-4+ maskwriter for advanced chrome on glass reticles, Proc. SPIE 3873, 493 (1999)

J. G. Hartley and T. R. Groves, Chrome on glass mask writing at 75kV with the IBM EL4+ electron-beam system, J. Vac. Sci Technol. B 17, 2932 (1999)

M. A. Sturans, J. G. Hartley, and R. A. Kendall, Measuring electron-beam landing angle in real time, J. Vac. Sci. Technol. B 17, 2823 (1999)

M. A. Sturans, J. G. Hartley, H. C. Pfeiffer, R. S. Dhaliwal, T. R. Groves, J. W. Pavick, R. J. Quickle, C. S. Clement, G. J. Dick, W. A. Enichen, M. S. Gordon, R. A. Kendall, C. A. Kostek, D. J. Pinckney, C. F. Robinson, J. D. Rockrohr, J. M. Safran, J. J. Senesi, E. V. Tressler, EL5: One tool for advanced x-ray and chrome on glass mask making, J. Vac. Sci. Technol. B 16, 3164 (1998)

Denise M. Puisto, Mark S. Lawliss, Janet M. Rocqui, Kurt R. Kimmel, and John G. Hartley, Multiple-pass writting optimization for proximity x-ray mask making using electron-beam lithography, J. Vac. Sci. Technol. B 14, 4341 (1996)

James D. Rockrohr, Rainer Butsch, William Enichen, Michael S. Gordon, Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer, Performance of IBM's EL-4 e-beam lithography system, SPIE 2437, 160 (1995)

R. Butsch, W. A. Enichen, M. S. Gordon, T. R. Groves, J. G. Hartley, J. W. Pavick, H. C. Pfeiffer, R. J. Quickle, J. D. Rockrohr, and W. Stickel, Performance enhancements on IBM's EL-4 electron-beam lithography system, J. Vac. Sci. Technol. B 13, 2478 (1995)

T. R. Groves, J. G. Hartley, H. C. Pfeiffer, D. Puisto, D. K. Bailey, Electron beam lithography tool for manufacture of X-ray masks, IBM Journal of Research and Development, 37(3) 411 (1993)

H. C. Pfeiffer, D. E. Davis, W. A. Enichen, M. S. Gordon, T. R. Groves, J. G. Hartley, R. J. Quickle, J. D. Rockrohr, W. Stickel, and E. V. Weber, EL-4, a new generation electron-beam lithography system, J. Vac. Sci. Technol. B 11, 2332 (1993)

John Hartley, Timothy Groves, and Hans Pfeiffer, Performance of the EL-3+ maskmaker, J. Vac. Sci. Technol. B 9, 3015 (1991)

J. G. Hartley and M. Fink, An electron diffraction study of alkali iodide vapors, J. Chem. Phys. 89, 6053 (1988)

J. G. Hartley and M. Fink, An electron diffraction study of alkali fluoride vapors, J. Chem. Phys. 89, 6058 (1988)

J. G. Hartley and M. Fink, An electron diffraction study of alkali bromide vapors, J. Chem. Phys. 87, 5477 (1987)

R. J. Mawhorter, M. Fink and J. G. Hartley, An electron diffraction study of alkali chloride vapors, J. Chem Phys. 83, 4418 (1985)

John R. Ray and John G. Hartley, Solutions to N-dimensional time-dependent Schrodinger equations, Physics Letters 88, 125 (1982)

John G. Hartley and John R. Ray, Solutions to the time-dependent Schrodinger equation, Phys. Rev. A 25, 2388 (1982)

John G. Hartley and John R. Ray, Coherent states for the time-dependent harmonic oscillator, Phys. Rev. D 25, 382 (1982)

John G. Hartley and John R. Ray, Ermakov systems and quantum-mechanical superposition laws, Phys. Rev. A. 24, 2873 (1981)

U.S. Patents:

Patent 6822248
Spatial Phase Locking with Shaped Electron Beam Lithography
Hartley, J.G., Ferrera, J., Goodberlet, J. G., Groves, T. R., Mondol, M. K., Schattenburg, M. L., Smith, H. I.

Patent 6818906
Electron Beam Position Reference System
Hartley, J.G., Kendall, R.A., Pinckney, D.J., Rieland, A.

Patent 6614035
Multi-Beam Shaped Beam Lithography System
Hartley, J.G.

Patent 6486953
Accurate Real-Time Landing Angle and Telecentricity Measurement in Lithographic Systems
Hartley, J.G., Gordon, M.S., Sturans, M.A., Rockrohr, J.D.

Patent 6437347
Target Locking System for Electron Beam Lithography
Hartley, J.G., Kendall, R.A. (2002)

Patent 6369396
Calibration Target for Electron Beams
Hartley, J.G., Kendall, R.A., Groves, T.R., Sturans, M.A. (2002)

Patent 6291819
Method of Calibrating an Electron Beam System for Lithography
Hartley, J.G. (2001)

Patent 6177680
Correction of Pattern-Dependent Errors in a Particle Beam Lithography System
Hartley, J.G., Dick, G.J., Ganong, A.S., Puisto, D.M., Pavick, J.W. (2001)

Patent 6091072
Piece-Wise Processing of Very Large Semiconductor Designs
Hartley, J.G., Dick, G.J., Frei, J.B., Ganong, A.S., Pavick, J.W. (2000)

Patent 6090528
Spot-to-Spot Stitching in Electron Beam Lithography
Hartley, J.G., Gordon, M.S. (2000)

Patent 5917932
System and Method for Evaluating Image Placement on Pre-Distorted Masks
Hartley, J.G. (1999)

Patent 5916716
Emulation Methodology for Critical Dimension Control in E-Beam Lithography
Hartley, J.G., Groves, T.R., Butsch, R. (1999)

Patent 5838013
Method for Monitoring Resist Charging in a Charged Particle System
Hartley, J.G., Gordon, M.S., Butsch, R., Enichen, W.A. (1998)

Patent 5825039
Digitally Stepped Deflection Raster System and Method of Use Thereof
Hartley, J.G. (1998)

Patent 5798528
Correction of Pattern Dependent Position Errors in Electron Beam Lithography
Hartley, J.G., Butsch, R., Stickel, W. (1998)

Patent 5773836
Method for Correcting Placement Errors in a Lithography System
Hartley, J.G. (1998)

Patent 5621216
Hardware/Software Implementation for Multipass E-Beam Mask Writing
Hartley, J.G., Tressler, E.V., Enichen, W.A. (1997)

Patent 5570405
Registration and Alignment Technique for X-Ray Mask Fabrication
Hartley, J.G., Chan, K.T., Sturans, M.A., Enichen, W.A. (1996)